Plasma Technology

 

Principles and Design of a Low Pressure Plasma System

1  =  Vacuum pump ON                  6  =    Plasma Chamber
2  =  Valve for Process Gases7  =    Elektrode
3  =  Generator ON8  =    Pressure Sensor
4  =  Vacuum pump OFF9  =    Process Gas
5  =  Ventilation Valve10  =  Substrate
11  =  Control Unit

Principles of a Low Pressure Plasma System with High Frequency Plasma Generation

 

 

Components of a Low Pressure Plasma System

Component           Configuration       
(optional)         
     Characteristics
Plasma Chamber
(Recipient)
Electrodes

Stainless steel
Planar or Barrelel Electrode
Frequently the Stainless Steel Plasma Chamber is used as the second Electrode 

Substrate Carrier

Electrode
Storey Carrier
Rotary Drum
Quartz Stack
(special designs for specific applications)

Precursor Imput

1 - 4 Gas Cylinders
Blubber Bottles

Gas Supply

Needle Valves (manual Control)
MFC (PCCE-Steuerung)

Sensors

Pressure Sensores
Gas Flow Sensors
Temperature Sensores

Controlmanual / 
automatic

Single Switch Control
Operation Errors excluded,
automatic Parameter Setup

PCCE

Touchscreen-Menue
free Setup for all Parameters

Generator100 kHz

600 Watt

Vacuum System
Pump

Rotary Vane Pumps
Roots Pumps

Ölabscheidung 

Oil Separation

Aktivkohlefilter

Charcoal Filter

 

 

Characteristic Process Parameters for Low Pressure Plasma Systems

Chamber pressure

typical 0,1 - 1 mbar
10-3 bis 10 mbar are possible

Chamber volume

typical 2 - 100 liters.
Special systems >10.000 liters

Generator Frequencies                              

40 kHz - 100 kHz
+ approved IMS Frequencies within the RF-range:
13,56 MHz, 27,12 MHz

Generator Energy

typical 500 Watt

Prozess Gases

Luft, O2, N2, Argon, H2, LF4, C2H2,
Several additional gases especially for Plasma polymerisation applications
In theory any gaseous substance can be applied
Plasmalution enables parrallel connection of two pressure gas cylinders.

Prozess Time

Typical 1 - 5 Minutes für Cleaning and Activation.

Etching and Plasma Coating may take any time depending on the thickness of the layers


Substrate dimensions

The complete Plasma Chamber can be used.

PCCE Control
PCCE Control operated on the LCD-Touchscreen-Display.
manual control
Manual / semi automatic by single switch operation; Protection against operation errors